Abstract
We propose a set of principles to tailor and enhance optical forces between parallel, periodic dielectric waveguides by molding the eigen-mode field distribution via the combined effects of highly symmetric slow light modes and waveguide morphology. The geometries here considered are amenable to standard lithographic techniques and possess strong repulsive and attractive optical forces that can be enhanced via slow-light band edge modes. This new methodology should enable the fabrication of optomechanical devices for applications in sensing, switching and nano-optomechanical systems.
Highlights
Optical forces are due to momentum exchange between photons and their surrounding media [1]
We propose a set of principles to tailor and enhance optical forces between parallel, periodic dielectric waveguides by molding the eigen-mode field distribution via the combined effects of highly symmetric slow light modes and waveguide morphology
The geometries here considered are amenable to standard lithographic techniques and possess strong repulsive and attractive optical forces that can be enhanced via slow-light band edge modes
Summary
Sign-in/Register to view highlights & summary Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
