Abstract
A secondary ion source has been developed for an organic ion microprobe capable of imaging sampes up to 2 cm in diameter. The source uses a focused 5 keV Cs + ion beam which is rastered across the sample surface, and secondary ions from each point on the sample are collected and formed into a low energy beam to be analyzed by a quadrupole mass filter. Dynamic emittance matching is employed to deflect ions from off-axis points on the sample back onto the mass analyzer axis. Rastering and dynamic emittance matching are rapidly controlled by assembly language programs using an IBM/AT (80286) type computer. A low energy ion monitor was used to tune and evaluate the secondary ion source by providing a magnified cross-sectional image of the ion beam at the source exit aperture. A well-focused and centered secondary ion beam was obtained from each point on the sample, indicating that large-scale dynamic emittance matching with high collection efficiency is possible. Mass resolved images of grids and glycerol samples are shown to demonstrate the performance of the integrated secondary ion source mass analyzer and control system.
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