Abstract
Two-dimensional (2D) materials are attractive candidates for high-performance photodetectors due to their wide operating wavelength and potential to integrate with silicon photonics. However, due to their limited atomic thickness and short carrier lifetime, they suffer from high driving source-drain voltages, weak light-matter interactions and low carrier collection efficiency. Here, we present a high-performance van der Waals (vdWs) heterostructure-based photodetector integrated on a silicon nitride photonic platform combining p-type black phosphorus (BP) and n-type molybdenum disulfide (MoS2). Owing to the efficient carrier separation process and dark current suppression at the junction interface of the vdWs heterostructure, high photodetectivity and a fast response speed can be achieved. A fast response time (∼2.08/3.54 μs), high responsivity (11.26 mA W-1), and a high light on/off ratio (104) operating in the near-infrared telecom band are obtained at zero bias. Our research highlights the great potential of the high-efficiency waveguide-integrated vdWs heterojunction photodetector for integrated optoelectronic systems, such as high-data-rate interconnects operated at standardized telecom wavelengths.
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