Abstract
THERE are many studies1–7 of the presence of inert gases in glasses. Because they have no electron affinity and high ionisation potentials (12 eV for Xe to 24 eV for He) the solubility of inert gases in glasses has been considered a simple physical process with no strong chemical interaction within the glass network. Recent work on pressure dependence of inert gas in vitreous1 and crystalline2 silica (SiO2) showed that the equilibrium solubility may be explained qualitatively by a statistical thermodynamic model3. At non-equilibrium conditions, however, a large quantity of inert gases can be incorporated into SiO2 by processes such as glow discharge8,9 and sputtering10,11, and here, the amount of inert gases in SiO2 far exceeds the equilibrium solubility. Using a high-rate sputtering technique, we prepared a SiO2 deposit containing 16.1 at. % Kr, expressed by a glass formula, Kr·2SiO2 and we report here the unique characteristics of this material.
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