A very high charge, high polarization gradient-doped strained GaAs photocathode

Abstract

A high-gradient-doping technique is applied to strained polarized photocathodes. A 5.0– 7.5 nm p-type surface layer doped to 5×10 19 cm −3 is found sufficient to overcome the surface charge limit while maintaining high beam polarization. This technique can be employed to meet the charge requirements of the Next Linear Collider with a polarization approaching 80%.