A versatile WIBS 200 kV ion implanter for materials modification

Abstract

The Whickham Ion Beam Systems 200 kV ion implanters at the Royal Melbourne Institute of Technology and at Harwell are used for a wide range of materials modification applications covering semiconductor devices, metals, polymers, insulators and industrial components. In particular, this paper describes flexible features of the prototype RMIT machine, concentrating on the scanning and endstation arrangements. Selected applications are reviewed, with particular attention given to variable temperature implantations into semiconductors.