Abstract
We demonstrate a diffractive maskless lithographic system that is capable of rapidly performing both serial and single-shot micropatterning. Utilizing the diffractive properties of phase holograms displayed on a spatial light modulator, arbitrary intensity distributions were produced to form two and three dimensional micropatterns/structures in a variety of substrates. A straightforward graphical user interface was implemented to allow users to load templates and change patterning modes within the span of a few minutes. A minimum resolution of ~700 nm is demonstrated for both patterning modes, which compares favorably to the 232 nm resolution limit predicted by the Rayleigh criterion. The presented method is rapid and adaptable, allowing for the parallel fabrication of microstructures in photoresist as well as the fabrication of protein microstructures that retain functional activity.
Highlights
Microfabrication via wavefront modulation has several key advantages that could prove useful for the development of many lab-on-a-chip technologies
Diffractive maskless lithography uses computer-generated holograms that are displayed on a phase-only spatial light modulator (SLM) to shape and distribute coherent laser light in three dimensions
The phase distributions displayed on the SLM, commonly termed phase holograms, are derived from the Gerchberg-Saxton algorithm (GSA) [20] and generate 2D light distributions by adjusting the phase of a uniform wavefront
Summary
Microfabrication via wavefront modulation has several key advantages that could prove useful for the development of many lab-on-a-chip technologies. In addition to improving parallel processing capability by providing a multi-foci and single-shot mode, phase holograms can create and direct intensity distributions into multiple planes This level of control surpasses that of optical projection lithography (OPL) which can only create patterns within a single projection plane [10,11,17,18,19]. We combine the desirable traits of several lithographic processes into a single dynamic, maskless, and holographic process that is capable of rapid 3D microfabrication In this approach, laser light is directed into arbitrary intensity distributions and multiple planes via phase holograms displayed on a spatial light modulator (SLM). The availability of this option, coupled with the ability to perform 3D patterning of arbitrary features, provides greater flexibility for the fabrication or modification of lab-on-a-chip devices
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