Abstract

We report the results of the first-principles density functional theory calculations for the adsorption of thiophene (C4H4S) on Cu(100) and Ni(100) surfaces. The adsorption properties on these surfaces are evaluated for several adsorption configurations, and the calculations are performed with the inclusion of van der Waals (vdW) interactions invoking the optimized vdW (optB86b-vdW, optB88-vdW, and optPBE-vdW) as well as revPBE-vdW and rPW86-vdW2 functionals. In agreement with the earlier reports, on both surfaces, the most stable adsorption configurations correspond to the hollow-45 at which the thiophene adsorbs parallel to the surface. For the adsorption on Ni(100), in agreement with the experimental observations, we confirm that thiophene spontaneously ruptures via breaking of a C–S bond when the center of the molecule is placed over a bridge site. On the basis of both the bond distribution and charge transfer analysis, we conclude that the rupturing of thiophene observed at the bridge-45 configuratio...

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