A unit process simulator for ion implantation through composite material using MATLAB

Abstract

With the rapid development in semiconductor technology, multi-million transistors are integrated on a System-on-Chip (SoC) to realize the complete functionality of a system. Due to rapid advancement in the field of VLSI technology – with the dimensions shrinking to 30 nm or less, the need for better understanding and proper simulation and optimization of fabrication process steps has become absolutely essential. This requires powerful simulators for various technological steps. The currently available simulators are all stand-alone, integrate all the processing steps and hence are very complicated and exorbitantly expensive. The research and development in the area of process technology, especially in academic environment, does not often require integrated tools. Instead process simulators for unit processing are enough. Powerful computational softwares like Matlab are quite common and available in almost every academic/industrial research and development environment. The use of vast potential of MATLAB can therefore be utilized to develop more advanced and low cost process simulators. An attempt has therefore been made to successfully develop a unit process simulator for ion implantation through composite material used in today’s very large scale integration (VLSI) technology. Key words: Very large scale integration (VLSI) technology, simulation, doping, ion-implantation, MATLAB.