Abstract
A thin film of N-(9-fluorenylmethylcarboxy)cysteine-derived oligosiloxane was prepared and subjected to photobase-induced patterning from the polycondensation of siloxanes. The photopatterned film was then treated with a silver ammine complex to deposit successfully a silver species. X-Ray photoelectron spectroscopy (XPS) measurements of the deposited silver film indicated the presence of disulfide and atomic silver inside the film, whereas the silver on the surface of the film was in an oxidized state. Quartz crystal microbalance and XPS measurements showed that the amino groups and amide moieties may contribute to the interaction towards the silver species. The deposited silver layer exhibited a resistivity of 2 × 10−1 mΩ cm.
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