Abstract
Over the last 20 years, X-ray Lithographie, Galvanoformung, Abformung (LIGA) based on the use of synchrotron radiation has been demonstrated to be capable of producing microstructure with near vertical sidewalls and high aspect ratios. Yet there has been little industrial take-up of the technology while competing technologies have been developed and used. In addition to financial and access difficulties with synchrotron facilities there are significant problems with the lack of reproducible processes that can be obtained at more than one synchrotron. This can result in costly repetition of process development and mask manufacture and in significant delays in getting a product to market. The variation of the linewidth of a microstructure is a sensitive measure of the tolerances likely to be achieved in production. A study has been made about the effect of standardising the exposure process at a number of synchrotrons throughout the world and the special masks required.
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