Abstract
The mechanical and chemical properties of transition metal nitrides are very attractive for numerous industrial applications. Thin nitride films are expected to be good diffusion barrier in microelectronic devices. Nitrogen diffuses into the whole thickness of the molybdenum film heated at low temperature and exposed to expanding plasma of (Ar-N2-H2) compared with pure N2 plasma. NHx species in the plasma are produced by different homogeneous or heterogeneous reactive mechanisms that results in an expansion of the plasma compared with pure N2 plasma. NHx species and probably H atoms improve the transfer of nitrogen into the metal by preventing the formation of MoO2 oxides which act as a barrier of diffusion for nitrogen.
Highlights
IntroductionThe attractive mechanical and chemical properties make transition metal nitrides and especially molybdenum nitrides very suitable for various applications
The attractive mechanical and chemical properties make transition metal nitrides and especially molybdenum nitrides very suitable for various applications.Molybdenum nitrides have high wear resistance, hardness values ranging from 28 to 34 GPa compared with values ranging from 18 to 24 GPa for TiN and CrN, that makes Mo-N compounds as potential materials for applications in tribology
The thermochemical process using expanding plasma of (Ar-N2-H2) mixtures improves the diffusion of nitrogen into thin films of molybdenum metal coated on Si substrates heated at low temperature
Summary
The attractive mechanical and chemical properties make transition metal nitrides and especially molybdenum nitrides very suitable for various applications. The diffusion of nitrogen into the molybdenum films is discussed and correlated to the composition of plasma and especially hydrogen species such as excited and ionized nitrogen-hydrogen radicals; NHx
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