Abstract
Plasma polymerization in glow discharges was investigated in a bell jar type RIE system. The rate of polymerization in Å/min, , was studied as a function of dc self‐bias in the range −200 to −530V. It was found that at the lower values of dc self‐bias, there was considerable enhancement in on the powered electrode compared to that on the grounded electrode. decreased monotonically on the powered, and increased monotonically on the grounded electrode as the dc self‐bias increased. At the higher values of dc self‐bias within our range of investigation, polymer formation was suppressed on the powered electrode, eventually falling to zero. XPS analysis indicated a lower fluorine content for polymer deposited on the powered electrode. A model is proposed for the plasma polymerization mechanism and some of its implications investigated using Monte Carlo simulations.
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