Abstract
To improve the purity, repetition capability, uniformity, and turn-on delay of conventional intense pulsed ion sources, a cryogenic diode was proposed a few years ago. The diode uses the plasma produced by the flashover of condensed materials on the cryogenic anode surface as an ion source. In connection with this ion source, surface flashover processes of low-temperature materials were studied and the production process of an anode plasma at a low-temperature-type ion source was discussed. Ion beam production from adsorbed materials on a porous alumina ring and condensed materials on the cooled anode was also performed.
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