Abstract
AbstractCorrosion of the titanium glue layer in a Ti/TiN/Al(Cu) /TiN ARC metal stack is observed during post metal etching polymer stripping in an alkaline chemical stripper. This novel corrosion only occurs when the underlying tungsten via plug is exposed, and leads to high resistance in vias. Investigation of the mechanism is attempted through variation of the polymer stripping duration, the deposition of the titanium and the polymer stripper, and the nitridization of the titanium layer. The high via resistance effect is solved by using analternate polymer stripper which is considered to be an inactive electrolyte for the galvanic reaction between the titanium glue layer and the exposed tungsten via.
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