Abstract

In this study, FEM (Finite Element Method) and experiments were performed to obtain the optimal condition for the electroforming process used to fabricate a multi-layered and high aspect ratio micro-structure. Especially, the influence of current density and electrolyte concentration on a cantilever type LCD probe needle was investigated. It was found that the current density is proportional to the thickness of the deposited metal. A finer metal structure and compact surface of the LCD pin was formed by the electroforming process than by the etching process. The experiment results show that structures maintain good fidelity. Ion discharge occurred slowly at low current densities, which made the deposited crystal bigger and coarser. On the other hand, high current densities made the crystal of the deposited structure finer and atom generating rate higher.

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