Abstract
In continuation with the studies on the specific features of the sputtering process of the AMG aluminum alloys containing 0.5% Sc, the authors determined the composition of the sputtered particles during bombardment with 10-keV H/sup +/ ions at 200 C using an ILU-2 ion accelerator. In order to study the distribution of elements in the ion bombarded alloy, the Auger electron analysis of the bombarded targets was carried out after layer-by-layer etching with 2-keV Ar/sup +/ ions. The mass of the targets was determined before and after bombardment by weighing them. The results obtained by using the Rutherford back scattering method indicate that the process of selective sputtering of the alloy is superimposed by other phenomena leading to a change in the initial chemical composition of the surface layer.
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