Abstract
A single-crystal FeSi(100) sample has been studied by means of X-ray photoelectron diffraction (XPD) and low-energy ion scattering (LEIS) in order to investigate the structure and the composition of the outermost atomic layers. XPD intensity plots for the Fe 2p and Si 2s core levels were acquired, and the experimental results were compared with theoretical calculations. Good agreement was found for the bulk-like surface model. The LEIS results indicate that the surface is silicon-terminated.
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