Abstract
The purpose of this study was to investigate the effect of irradiation on the polymerization behavior of a bonding agent of a dual-cured self-etching bonding system. By means of electron spin resonance spectroscopy, it was shown that the concentration of polymer radicals in samples cured chemically without irradiation was closely similar to that in samples dual-cured under irradiation. There was no significant difference in the time required to reach the maximum spin concentration between these two sample groups, thereby showing that the radical generation rates were similar. Findings of this study revealed that the dual-cured self-etching bonding system tested in this study was effective in polymerization in regions where irradiated light could hardly reach.
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