Abstract
Improvement of the optical recording process in the Cu-As2S3 structure in the whole visible band was observed when the structure is simultaneously exposed and charged in the field of a negative corona discharge as compared to the standard direct recording in the above-mentioned structure. It was shown that using the negative corona discharge for recording in these structures allows the holographic sensitivity and diffraction efficiency of the recorded holographic diffraction gratings to be increased several-fold compared to gratings obtained by the standard approach. The results are discussed using the known photoelectrical model.
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