Abstract
Photoelastic experiment has two significant problems. The first problem is manufacturing a model specimen for complicated shapes of structures. The second problem is residual stress contained in the photoelastic model material. In this paper, the stress optic law that can be effecitvely used on photoelastic model materials with residual stress is developed. By using the stress optic law as developed in this research, we can obtain good results in photoelastic experiments using model material in which residual stress is contained. It is assured that the stress optic law developed in this research is useful. Therefore, it is suggested that the stress optic law considering residual stress can be applied to the photoelastic experiment for the stress analysis of the composite materials or bi-materials in which the residual stress is easily contained.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
