Abstract
The curing of 3-glycidoxypropyltrimethoxy silane films deposited on FPL-etched aluminum from a pH5 buffered aqueous solution under a range of ambient conditions is studied. The adherence of the deposited films is tested by rinsing the cured films with deionized water and determining how much of the film remains with grazing angle FTIR. Results indicate that the curing is inhibited by humid conditions. The sensitivity to the ambient humidity increases with increasing temperature so that at 60°C only a poor cure is obtained at 50% relative humidity. Very rapid curing can be obtained over a wide temperature range at very low relative humidities. The implication of these results for the creation of silane films under field conditions where temperature and humidity cannot be properly controlled is discussed.
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