Abstract
The plasma in a physical vapor deposition (PVD) system used for the deposition of hard coatings (TiN, CrN) was studied by means of a Langmuir probe and energy resolved spectroscopy (Balzers plasma process monitor PPM 421). I– V measurements gave the plasma ( U pl) and floating ( U fl) potentials, as well as the electron temperature T e and plasma density n i . U pl deduced from I– V measurements agreed well with the peak of the positive ion energy distribution, as well as with the highest positive potential for the given operational mode. Energy spectra measured in deposition of TiN show a high degree of ionization of Ti, with Ti 2+ as the prevalent ion. T e calculated from the Maxwellian distribution for the standard deposition of TiN is rather high ( T e=6–8 eV). We believe that the oscillations of the plasma potential with the measured amplitude up to 15 V are most probably the reason. The electron energy distribution F( E) is better described by the Druyvesteyn distribution one than by a Maxwellian one.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
