Abstract
The galvanic corrosion of Cu/Co in different H2O2-containing solutions has been investigated. The results show that low H2O2 concentration not only leads to galvanic corrosion, but also causes severe pitting on Co surface. Hydroxyl radicals induced by Fenton-like reactions are related to the pitting, which mainly takes place at the grain boundaries. Potentiodynamic polarization and SEM results demonstrate that benzotriazole (BTA) is ineffective in inhibiting pitting and reducing the galvanic corrosion, while 1-phenyl-3-methyl-5-pyrazolone (PMP), which is a strong free radical scavenger, can significantly mitigate the galvanic corrosion. In combination with BTA, a more robust pitting inhibition is obtained. The roles of BTA and PMP and the mechanisms of the synergistic effect are proposed and discussed.
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