Abstract

Collective interactions in functional materials can enable novel macroscopic properties like insulator-to-metal transitions. While implementing such materials into field-effect-transistor technology can potentially augment current state-of-the-art devices by providing unique routes to overcome their conventional limits, attempts to harness the insulator-to-metal transition for high-performance transistors have experienced little success. Here, we demonstrate a pathway for harnessing the abrupt resistivity transformation across the insulator-to-metal transition in vanadium dioxide (VO2), to design a hybrid-phase-transition field-effect transistor that exhibits gate controlled steep (‘sub-kT/q') and reversible switching at room temperature. The transistor design, wherein VO2 is implemented in series with the field-effect transistor's source rather than into the channel, exploits negative differential resistance induced across the VO2 to create an internal amplifier that facilitates enhanced performance over a conventional field-effect transistor. Our approach enables low-voltage complementary n-type and p-type transistor operation as demonstrated here, and is applicable to other insulator-to-metal transition materials, offering tantalizing possibilities for energy-efficient logic and memory applications.

Highlights

  • Collective interactions in functional materials can enable novel macroscopic properties like insulator-to-metal transitions

  • The abrupt resistivity switching of VO2 in the hyper-FET configuration, which is the origin of the steep-slope characteristics, induces a negative differential resistance (NDR) across VO2 that results in internal voltage amplification which enhances the hyper-FET’s performance beyond that of a conventional Metal-oxide-semiconductor field-effect transistors (MOSFETs)

  • The abrupt insulator-to-metal transition (IMT) results in an NDR across the VO2. Such an NDR is induced because when the VO2 resistance decreases abruptly, it results in (a) an increase in in the drain-to-source current (IDS) (DIDS) which flows through the VO2 device and the MOSFET channel in series; (b) a reduction in the voltage across the VO2 device VVO2 ( À DVNDR)

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Summary

Introduction

Collective interactions in functional materials can enable novel macroscopic properties like insulator-to-metal transitions. Such an NDR is induced because when the VO2 resistance decreases abruptly, it results in (a) an increase in IDS (DIDS) which flows through the VO2 device and the MOSFET channel in series; (b) a reduction in the voltage across the VO2 device VVO2 ( À DVNDR) (see Supplementary Fig. 2 and Supplementary Note 2 for discussion on the NDR in VO2).

Results
Conclusion

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