Abstract
The scaling behaviour of surface roughness evolution of high rate deposited μc-Si:H by very high frequency plasma-enhanced chemical vapor deposition （VHF-PECVD） is investigated using spectroscopic ellipsometry （SE）. Films deposited at Pg=300 Pa with deposition rate of 5 ?/s, show abnormal scaling behavior with the exponent β of about 0.81, which is much larger than 0.5 of zero diffusion limit in the scaling theory. This implies that there are some roughening increasing mechanisms, and this roughening increasing mechanism is correlated with the shadowing effect.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
