Abstract

We constructed a soft-X-ray imaging microscope based on a multilayer-coated Schwarzschild objective. The Schwarzschild objective was designed to have a 50 x magnification and a numerical aperture of 0.25. The mirrors of the objective were coated with a Mo/Si multilayer to reflect the Si L emission. The overall throughput of the objective was 14% at a peak wavelength of 13.3 nm. The 5-μm wide stripe of SiO2 lithographically patterned was observed under irradiation with an electron beam of 1 μA.

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