Abstract
We have investigated a novel soft-imprint technique for fabrication of submicron scale polymer structures that can be simply performed at room temperature by polymerization with an elastomeric polydimethylsiloxane (PDMS) mold. The proposed technique is a simple, cheap and reproducible method for the patterning of large areas, and allows the transfer of polymer patterns at the submicron scale without high pressures. The PDMS mold is placed on a fluid mixture of prepolymer and monomer after a brief UV exposure; full polymerization follows; and then the mold is removed. Scanning electron microscopy (SEM) and atomic force (AFM) observations confirm that the submicron scale polymer structures are produced without defects or distortion and with good pattern fidelity over a large area.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
