A simple route of ordered high quality mesoscale stripe polymer patterns

Abstract

Fine ordered stripe patterns are developed through the evaporative self-assembly of a PMMA-toluene solution and O2 plasma for applications to optical waveguide devices. The stripe patterns were formed by repeating the “stick-slip” motion of the contact line in a restricted geometry. High-quality patterned lines were obtained by removing the residue of the pattern’s sidewall using an O2 plasma asher.