Abstract
According to ultraviolet (UV) spectroscopic studies, a positive AZ photoresist film thicker than 10 (m can hardly transmit UV lights of wavelengths 200–285 nm. A simple photomask for UV photolithography was prepared using a quartz glass plate coated with a light-obstructing film of positive AZ photoresist, and the quality of the photomask and fidelity of the pattern transferred by the photomask were evaluated. The developed AZ photoresist photomask was used for fabrication of gold microelectrode on polycarbonate (PC) sheets. PC sheetswere exposed to the UV lights emitted from a low-pressure mercury lamp and passed through the photomask. The PC sheets were subjected to selective surface photolysis in the exposed area. After a series of wet chemical reactions, nano gold particles serving as the catalyst for electroless plating were deposited on the irradiated area. Gold microelectrodes were then generated by immersing the selectively activated PC sheet in an electroless gold plating bath for a specific time. Without need for a clean room, the photomasks can be prepared by a chemist in a common chemical laboratory with low-cost materials and simple procedures.
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