Abstract
We describe a source of negative ions by cesium sputtering (SNICS) which has the simple axial geometry of the Hill-Nelson positive-ion sputter source. However the filament which provides the axial magnetic field also serves as a surface ionization source of Cs +. Like the Aarhus negative ion source (ANIS) our geometry preferentially focusses those negative ions which directly sputter from the cathode and which fall through the cathode potential drop. The source has negative-ion current, emittance, and brightness comparable or superior to other sputter sources of negative ions. The erosion pattern of the sputter cathode suggests that the Cs + ions involved in the sputtering process do not necessarily originate in the plasma.
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