A simple and efficient technique of interlayer interface Ar+ etching to enhance tribological properties in TiSiN/TiAlN coating

Abstract

In this paper, a simple and efficient technique of interlayer interface Ar+ etching is presented to regulate the microstructure and properties of the TiSiN/TiAlN coating deposited by arc ion plating. SEM, AFM, XRD, and EIS of the TiAlN coating indicate that Ar+ bombardment can reduce the roughness and porosity density. HR-TEM reveals the presence of epitaxial growth at the interlayer interface. The TiSiN/TiAlN coating exhibits high bonding force (Lc3 around 118.7 N) and excellent toughness (CPRs around 2230.2 N2) at − 300 V etching. The wear rate and COF of the coating are reduced to 4.26 × 10−5 mm3∙N−1∙m−1 and 0.295. The results demonstrate that interlayer interface Ar+ etching can effectively optimize the interlayer quality and enhance the wear resistance of the multilayer coating.