Abstract
A two-step etching method is used to prepare a Si-based suspended tunnel structure with a trapezoidal section. In the first wet etching, surfactant Triton-X-100 is added to tetramethylammonium hydroxide (TMAH) enchant to inhibit crystal plane characteristics. Bulk Si Rib with trapezoidal cross section is formed, with inclination of side and height being modulated by changing etching time, to obtain good stability. After the SiO2 support layer is grown by thermal oxidation, pure 25% TMAH is used in the second wet etching to quickly lateral etch and undercut the bulk silicon under the support layer and form a suspended structure along <100> opening. Using additive-no additive two-step etching method, suspended structure with high stability and compressive strength, good insulation characteristics, high yield can be prepared. It lays a solid foundation for developing high sensitivity photo, thermal, chemical and gas sensors.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
