A self-aligned fabrication process for silicon quantum computer devices

Abstract

We describe a fabrication process for devices with few quantum bits (qubits),which are suitable for proof-of-principle demonstrations of silicon-basedquantum computation. The devices follow the Kane proposal of using thenuclear spins of31P donors in28Si as qubits, controlled by metal surfacegates and measured using single-electron transistors (SETs). The accurateregistration of31P donors to control gates and read-out SETs is achievedthrough the use of a self-aligned process which incorporates electron beampatterning, ion implantation and triple-angle shadow-mask metal evaporation.