Abstract
The electron beam energy is a parameter required for quantitative electron probe microanalysis. In fact, it occurs in all parts of the ZAF type matrix correction procedure as well as in all of the other matrix correction procedures. Recently, there has been much interest in analyzing materials using lower beam voltages. Since the correction procedures use the so called “overvoltage” term (beam energy/excitation energy), uncertainties in the beam voltage will generate larger errors than when high beam voltages are used. The user may well be faced with an instrument that does not have a very precise voltmeter to measure the beam voltage, or the reported voltage may not actually represent the potential drop from the filament to ground (specimen). The true beam energy may differ from the “measured” potential drop by several hundred volts.It is difficult and potentially exciting to measure the beam voltage with a calibrated voltmeter; however, we have a built-in method available in the energy-dispersive x-ray detector.
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