A review of plasma process studies

Abstract

Research studies on glow discharge processes in our laboratory since its establishment are reviewed. Ionized gases at reduced pressures in the range 10 -3 - 1 Torr are useful sources of ions, electrons and activated species which can be used in a variety of surface treatment, deposition and etching processes. After discussing the general character of plasma techniques operated in low pressure gases the specific work of our laboratory in this field is described. The subjects considered are (i) the plasma oxidation of carbon and organic materials in r.f. and d.c. discharges and the effects of ion bombardment on gas emission and surface structure, (ii) the changes in surface topography and composition of metals exposed to inert and active ion bombardment, (iii) the plasma deposition of fluorocarbon and hydrocarbon polymer films, the r.f. sputtering of cermet films and the growth of amorphous carbon films under ion impact, (iv) the effects of d.c., r.f. and magnetron discharges on the potential of bodies immersed in their plasma regions and (v) the effects of impacting ions on the implanting of condensed metal atoms into glass by recoil collision. The relation of these subjects to process mechanisms and their uses is discussed. Process applications considered are surface cleaning, the passivating and hardening of metals, restoring antiquities and preparing optical and electrically conducting films.