Abstract
Abstract This review article discusses progress in surface plasmon resonance (SPR) of two-dimensional (2D) and three-dimensional (3D) chip-based nanostructure array patterns. Recent advancements in fabrication techniques for nano-arrays have endowed researchers with tools to explore a material’s plasmonic optical properties. In this review, fabrication techniques including electron-beam lithography, focused-ion lithography, dip-pen lithography, laser interference lithography, nanosphere lithography, nanoimprint lithography, and anodic aluminum oxide (AAO) template-based lithography are introduced and discussed. Nano-arrays have gained increased attention because of their optical property dependency (light-matter interactions) on size, shape, and periodicity. In particular, nano-array architectures can be tailored to produce and tune plasmonic modes such as localized surface plasmon resonance (LSPR), surface plasmon polariton (SPP), extraordinary transmission, surface lattice resonance (SLR), Fano resonance, plasmonic whispering-gallery modes (WGMs), and plasmonic gap mode. Thus, light management (absorption, scattering, transmission, and guided wave propagation), as well as electromagnetic (EM) field enhancement, can be controlled by rational design and fabrication of plasmonic nano-arrays. Because of their optical properties, these plasmonic modes can be utilized for designing plasmonic sensors and surface-enhanced Raman scattering (SERS) sensors.
Highlights
Light interaction with metal nanostructures demonstrates unique properties that have drawn the attention of researchers, giving rise to an emergent field called plasmonics
Electron-beam lithography, focused-ion lithography, dip-pen lithography, laser interference lithography, nanosphere lithography, nanoimprint lithography, and anodic aluminum oxide (AAO) templatebased lithography have been used for nanofabrication
The goal of this review is to introduce the basic concepts and principles of each plasmon mode, and demonstrate how plasmonic principles are used to design nano-array patterns and tune the optical responses, which provide a basis for light management and sensing applications
Summary
Light interaction with metal nanostructures demonstrates unique properties that have drawn the attention of researchers, giving rise to an emergent field called plasmonics. Electron-beam lithography, focused-ion lithography, dip-pen lithography, laser interference lithography, nanosphere lithography, nanoimprint lithography, and anodic aluminum oxide (AAO) templatebased lithography have been used for nanofabrication The availability of these lithography techniques endows researchers with powerful tools to create nano-arrays to support different plasmon modes that are excited and decayed in different manners, such as LSPR, SPP, Fano resonance, plasmonic whispering-gallery modes (WGMs), surface lattice resonance (SLR), and plasmonic gap mode. The goal of this review is to introduce the basic concepts and principles of each plasmon mode, and demonstrate how plasmonic principles are used to design nano-array patterns and tune the optical responses, which provide a basis for light management and sensing applications
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