Abstract
A regression model of an ion-atom collision cascade (and eventually of a displaced atom cascade) resulting under ion sputtering of amorphous and polycrystalline materials is developed. The model allows the description of the elastic scattering of atomic particles in a solid using various particle interaction potentials. Based on this model, we calculate the sputtering yields for materials with atomic numbers Z a=22–79 and the sputtering rates for several multicomponent targets. The results of statistical simulation within the model developed are compared with experimental data for the sputtering of amorphous and polycrystalline materials. It is shown that our model fits the experimental data up to the statistical error and adequately characterizes the ion sputtering process.
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