A quartz crystal microbalance (QCM)-based easy setup device for real-time mass change detection under high-power RF plasma.

Abstract

Sensing technologies serve a crucial role in monitoring and testing surface properties in biosensors, thin films, and many other industries. Plasma treatments are routinely used in most of these technologies to modify the surfaces of materials. However, due to the high radio frequency (RF) noise in plasma processes, real-time surface tracking is still rather difficult. In this study, we aim to construct an easy-to-set up mass change detection system capable of operating under RF plasma conditions. For this purpose, we have presented a novel technique that utilizes the quartz crystal microbalance sensor to detect mass changes in different plasma environments. The constructed device was then tested under 13.56MHz, 100W plasma atmosphere. The results showed that the resonance frequency of a crystal was successfully measured with 1.0Hz resolution under the impact of plasma-induced high power of RF noise. Moreover, as a preliminary study, we used ethylenediamine (EDA) to track changes in resonance frequency under plasma conditions and observed noise-free signals in frequency-voltage curves. Furthermore, the system's sensitivity was found to be 3.8 ng/Hz, with a test molecule (EDA) deposition of about 380 ng in the RF plasma atmosphere. Overall, this study focused on creating a relatively new approach for detecting the real-time mass change in a strong RF environment, which we believe could be an improved and easy-to-set up technique for plasma-based processes such as surface coating, etching, and activation.