A quantitative study of diffracted X-ray intensities from type I natural diamond crystals by high resolution X-ray diffractometry and comparison with nearly perfect silicon single crystals

Abstract

Results of accurate measurements of peak and integrated intensities of\(\bar 220,\bar 440,\bar 2\bar 24,\bar 1\bar 13\), 111 and 333 reflections of natural diamonds of type I and nearly perfect silicon single crystals are reported. Highly monochromated and collimated MoK α 1 exploring beam was used. A quadrupole crystal X-ray diffractometer was employed in (+, −, +) and (+, −, +, −) settings. (111) platelets of diamond and silicon crystals with thicknesses of about 1 mm were selected. High resolution diffraction curves, stationary and traverse topographs were recorded. Diffraction curve half widths of diamond and silicon crystals were in the range: 45–200 arc sec and a few arc sec respectively. The experimental values of integrated intensitiesρ for diamond crystals were found to lie between the theoretical values for ideally perfect and ideally imperfect crystals. Experimental values ofρ for silicon were closer to the “perfect crystal” values. This is consistent with the results of diffractometric and topographic evaluation. The peak intensities of all reflections were higher for diamond crystals in comparison to the silicon crystals. The ratioI C/I Si lies in the range 1.3 (111 reflection) to 10.5\((\bar 1\bar 13)\) and (333) reflections. This is anomalous and cannot be accounted for by considering the degree of perfection, structure factor and difference in absorption coefficient.