Abstract
Air monitors currently available for use at a semiconductor manufacturing facility, though accurate for a specific class of compounds, are of limited use for monitoring several classes of compounds (i.e., organic vapors, metal hydrides, and acid mists and gases) simultaneously. Preliminary research showed that the Fourier transform infrared (FTIR) spectrometer may be appropriate for detecting the various gases and vapors that could be present at a semiconductor manufacturing facility. A subset of the many gases and vapors used during the silicon processing sequence were diluted in air to sub-part-per-million (ppm) concentrations to simulate potential workplace conditions. The optimal wavelength region for quantitation, the effects of resolution on accuracy of quantitation, and the effect of spectral overlap on the accuracy of quantitation were studied. The preliminary results support the conclusion that the FTIR spectrometer is appropriate for quantitative air monitoring of selected compounds at a semicon...
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