Abstract

In this brief, a novel pseudo resistor bias scheme capable of achieving improved performances against process parameter variations is presented. The use of a matched structure allows for achieving a simulated statistical variation $\sigma/\mu$ one order of magnitude better than conventional bias schemes proposed in the literature. The entire circuit was designed to be able to emulate a tunable resistor whose resistance could be digitally set in the range of 400 $\text{M}\Omega$ –90 $\text{G}\Omega$ . The design of a very low frequency bandpass filter (BPF) for biopotential recording was also covered as a suitable application. The tunability offered by the bias scheme was employed, in this case, to realize a high-pass cutoff frequency variable in the range of 10 Hz–2 kHz. An integrated circuit including eight acquisition channels, each of which is composed of the designed BPF and a conventional 10-bit analog-to-digital converter, was finally realized in a CMOS 0.35- $\mu\text{m}$ process. The chip was successfully tested showing a measured $\sigma/\mu$ variation of the high-pass cutoff frequency equal to 0.13 when different channels on the same die are considered.

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