A possible route to fabricate patchy nanoparticles via self-assembly of a multiblock copolymer chain in one step

Abstract

By using computer simulations, we propose a simple route to fabricate 7–17 nm particles with controllable patch symmetry viaself-assembly of a polymer chain in one step. A single chain of polystyrene-polymethylmethacrylate (PS-PMMA) multiblock copolymer, which is intended to be a generic representative for common hydrophobic multiblock copolymers, is used to fabricate the patchy particles in a solvent that is poor for both components. Various kinds of patchy particles, such as one-patch (with C∞v symmetry), two-patch (with D∞h symmetry), three-patch (with D3hsymmetry), four-patch (with Td symmetry), and cross-ribbon patchy particles, have been obtained. Our work demonstrates that a rational bottom-up design of patchy nanoparticles with controllable symmetry is possible by manipulating the block copolymer chain length and solvent quality.