A Positive-Working Alkaline Developable Photoresist Based on t-Boc-Calix[4]resorcinarene and a Photoacid Generator

Abstract

Abstract A positive working photoresist based on octa-O-tert-butyl carbonated C-hexylcalix[4]resorcinarene (t-BOC-h-C4) and p-nitrobenzyl-9,10-dimethoxy-anthracene-2-sulfonate (NDS) as a photoacid generator has been developed. The photoresist consisting of t-BOC-h-C4 (90 wt%) and NDS (10 wt%) showed a sensitivity of 24 mJ/cm2 and a contrast of 8.1, when it was exposed to 365 nm light and postbaked at 90°C for 2 min, followed by developing with a 1% aqueous tetramethylammonium hydroxide (TMAH) solution at room temperature.