Abstract
An ion source suitable for secondary ion mass spectrometry (SIMS) is described. The source is of the magnetically confined oscillating electron bombardment type with axial ion extraction. For energies between 0.9 and 6.0 keV current densities of some 10 2 μA · cm −2 were attained and could be held constant for hours. The ion beam could be focussed to 0.8 mm diameter at a target 53 cm apart. A plane beam profile was achieved across the whole target area. On account of the plane beam profile and the large range of current densities the source is applicable in concentration profile analysis of surfaces as well as in “static” SIMS measurements.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
