Abstract
We have demonstrated and evaluated a grating array outcoupler fabricated by photoelectrochemical (PEC) etching, a manufacturable and practical approach for fabrication of grating-based III-V semiconductor waveguide devices. An array of submicron period gratings was etched into photolithographically delineated areas in a single PEC step. The fabricated devices are: 10-/spl mu/m wide rib waveguides with 0.35-/spl mu/m first-order outcoupling gratings; and 10-/spl mu/m wide rib waveguides with 10 /spl mu/m/spl times/10 /spl mu/m pixellated areas of gratings. Device characterization demonstrates the effectiveness of outcoupling grating fabrication using PEC and that the pixellated grating outcoupler is an effective and simple means of generating an optical beam array. >
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