A pattern-like micro-fine lines of circuits construction for the multi-touch screens

Abstract

The newest study plans to adopt electrochemical engineering as the technological premise for Multi-Touch Screen ITO (indium tin oxide) thin membrane etching by utilizing the electrochemical process to remove the conductive material ITO deposited on the D.C. positive charge. By coordinating the masked patterns as the template for etching on the Multi-Touch Screens ITO thin membrane layer with pattern-like micro-fine lines, it simplifies the previous metal etching's multilevel processes (the photoresist coating, exposure, imaging, etching of the photoresist and so forth) into a simple one-step process (mask-based electrochemical etching). The study findings show that: using the appropriate process parameters (including the electrical conditions; electrochemical liquid control; electrochemical byproduct removal and such) is able to derive a preferred etching quality on the line's side flange. Using a higher temperature or higher concentration of the processing liquid is able to derive a higher ITO line etching speed. As the masked micro-electrochemical etching method the study proposes is able to rapidly map out a micro-fine line pattern on the surface's Multi-Touch Screens ITO thin member layer within a relative short time. The Multi-Touch Screen ITO is easily constructed throughout the processes of semiconductor production.