Abstract

We report a novel technique to determine uniquely the second-order nonlinearity profile of nonlinear films. Applied to a thermally poled silica sample, it reveals a stronger coefficient d/sub 33/ (0.8 pm/V) than previously reported and important new profile features. Thermal poling is an interesting and potentially important technique used to induce a second-order optical nonlinearity in silica. This new and powerful technique is predicted to measure the nonlinearity and the nonlinearity profile of poled glasses and other nonlinear films.

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