A Novel SiC MOSFET Embedding Low Barrier Diode With Enhanced Third Quadrant and Switching Performance

Abstract

A novel planar gate SiC MOSFET embedding low barrier diode (LBD-MOSFET) with improved third quadrant and switching performance is proposed and characterized in this letter. The LBD-MOSFET not only exhibits about 3 times lower diode turn on voltage than the body diode, but also successfully eliminates bipolar degradation phenomena. A low potential barrier for electrons transporting from JFET region to N+ source region is formed in LBD-MOSFET owing to the existence of the depletion charge in LBD base region. Meanwhile, the gate-to-drain charge ( ${Q}_{\text {gd}}){}$ and gate-to-drain capacitance ( ${C}_{\text {gd}}){}$ of LBD-MOSFET are significantly reduced by about $21\times $ and $15\times $ in comparison with the conventional MOSFET (C-MOSFET), due to the reduction of the overlapping area of the gate and drift region. Therefore, the obtained high frequency figures of merit (HF-FOM $1= {R}_{\text {on,sp}}\times {Q}_{\text {gd}}$ and HF-FOM $2= {R}_{\text {on,sp}}\times {C}_{\text {gd}}$ ) for the LBD-MOSFET are improved by about 13 times and 9 times compared with C-MOSFET. Furthermore, a compact potential barrier analytical model based on Poisson’s Law is developed to understand the origin of low potential barrier diode in SiC LBD-MOSFET. The overall enhanced performances suggest SiC LBD-MOSFET is an excellent choice for high frequency power electronic applications.