A Novel Nanofabrication Technique Using Focused Ion Beam (FIB), Metal Organic Chemical Vapour Deposition (MOCVD)

Abstract

The aim of this paper is to present a novel nano-manufacturing technique for the fabrication of nano-scale systems, such as mechanical machines and printed circuits etc. The proposed technique utilizes a guided focused ion beam (FIB) through a pattern to a substrate where it decomposes a metal organic gas to generate a reduced outline copy of the mask, yielding the required design system. The novelty of this technique is in the ability to fabricate nano-scale systems layer-by-layer rather than atom-by-atom through the adjustment of the vertical position of the fabricated part.To demonstrate the proposed technique, a simulation model was designed and tested. The simulation results have shown that a reduction in the perimeter of the fabricated part can be achieved easily by adjusting its vertical position with respect to the beam focused point by a 100 to 400 times. Further investigation revealed that the growth rate is a function of the precursor flux. For example, using a titanium precursor flux below the 2x1010 molecules/cm2.s then sputtering is more predominant, and above that value, a net deposition will occur at a growth rate of 5.3x10-05cm/s.